ECE442H1: Introduction to Micro- and Nano-Fabrication Technologies

0.50
24.4L/12.2T/24.4P

An introduction to the fundamentals of micro- and non-fabrication processes with emphasis on cleanroom practices. The physical principles of optical lithography, electron-beam lithography, alternative nanolithography techniques, and thin film deposition and metrology methods. The physical and chemical processes of wet and dry etching. Cleanroom concepts and safety protocols. Sequential micro-fabrication processes involved in the manufacture of microelectronic and photonic devices. Imaging and characterization of micro- and nano-structures. Examples of practical existing and emerging micro- and nano-devices.
Emphasis will be hands-on learning. Students, divided in small groups, will use the tolls and equipment at the Toronto Nanofabrication Cantre (TNFC) and the Open Centre for the Characterization of Advanced Materials (OCCAM). Limited enrollment.

42.7 (Fall), 42.7 (Winter), 85.4 (Full Year)